Influence of hydrogen on behaviour of reactive magnetron sputtering

Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216224%3A14310%2F12%3A00057726" target="_blank" >RIV/00216224:14310/12:00057726 - isvavai.cz</a>
Result on the web
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DOI - Digital Object Identifier
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Result language
angličtina
Original language name
Influence of hydrogen on behaviour of reactive magnetron sputtering
Original language description
This work studies reactive magnetron sputtering in mixtures of the gases Ar, O2 and H2. The main part is formed by analyzes the hysteresis of the deposition process for the mixtures Ar+O2, Ar+H2 separately and comparison of the results with behaviour ofthe system for the Ar+O2+H2 mixture. Behaviour of the system is studied for the case of deposition titanium oxide layer.
Czech name
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Czech description
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Project
Result was created during the realization of more than one project. More information in the Projects tab.
Continuities
P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)

Publication year
2012
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Article name in the collection
Potential and Applications of Surface Nanotreatment of Polymers and Glass: Book of Extended Abstracts
ISBN
9788021059795
ISSN
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e-ISSN
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Number of pages
2
Pages from-to
126-127
Publisher name
Masaryk University
Place of publication
Brno
Event location
Brno
Event date
Jan 1, 2012
Type of event by nationality
EUR - Evropská akce
UT code for WoS article
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