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Characterization of plasma pencil pulsed discharge

The result's identifiers

  • Result code in IS VaVaI

    <a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216224%3A14310%2F12%3A00061193" target="_blank" >RIV/00216224:14310/12:00061193 - isvavai.cz</a>

  • Result on the web

    <a href="http://dx.doi.org/10.1109/TPS.2012.2213275" target="_blank" >http://dx.doi.org/10.1109/TPS.2012.2213275</a>

  • DOI - Digital Object Identifier

    <a href="http://dx.doi.org/10.1109/TPS.2012.2213275" target="_blank" >10.1109/TPS.2012.2213275</a>

Alternative languages

  • Result language

    angličtina

  • Original language name

    Characterization of plasma pencil pulsed discharge

  • Original language description

    In this paper, the optical emission spectroscopy (OES) of plasma pencil generated at atmospheric pressure with pulsed voltage was studied. Single-electrode and two-electrode configurations to approximate the conditions during various material treatment have been compared. By means of time-resolved OES, particle behavior during pulse duration, particularly atomic and molecular components represented by Ar lines and OH band, has been studied. The axial distribution of the rotational and the electron temperature showed that the presence of conductive material in plasma jet increased the rotational and electron temperature and even influenced the particle behavior inside the plasma nozzle. Furthermore, it was found that rotational temperature can be easilycontrolled by the duty cycle.

  • Czech name

  • Czech description

Classification

  • Type

    J<sub>x</sub> - Unclassified - Peer-reviewed scientific article (Jimp, Jsc and Jost)

  • CEP classification

    BL - Plasma physics and discharge through gases

  • OECD FORD branch

Result continuities

  • Project

    <a href="/en/project/ED2.1.00%2F03.0086" target="_blank" >ED2.1.00/03.0086: Regional R&D center for low-cost plasma and nanotechnology surface modifications</a><br>

  • Continuities

    P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)

Others

  • Publication year

    2012

  • Confidentiality

    S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Data specific for result type

  • Name of the periodical

    IEEE Transactions on Plasma Science

  • ISSN

    0093-3813

  • e-ISSN

  • Volume of the periodical

    40

  • Issue of the periodical within the volume

    11

  • Country of publishing house

    US - UNITED STATES

  • Number of pages

    5

  • Pages from-to

    2920-2924

  • UT code for WoS article

    000311353200022

  • EID of the result in the Scopus database