Utilization of the sum rule for construction of advanced dispersion model of crystalline silicon containing interstitial oxygen
The result's identifiers
Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216224%3A14310%2F14%3A00079590" target="_blank" >RIV/00216224:14310/14:00079590 - isvavai.cz</a>
Result on the web
<a href="http://ac.els-cdn.com/S0040609014003514/1-s2.0-S0040609014003514-main.pdf?_tid=0ab31e60-cd51-11e4-974b-00000aacb361&acdnat=1426671048_33720b9a5f3421f518aa642d5757ebfa" target="_blank" >http://ac.els-cdn.com/S0040609014003514/1-s2.0-S0040609014003514-main.pdf?_tid=0ab31e60-cd51-11e4-974b-00000aacb361&acdnat=1426671048_33720b9a5f3421f518aa642d5757ebfa</a>
DOI - Digital Object Identifier
<a href="http://dx.doi.org/10.1016/j.tsf.2014.03.059" target="_blank" >10.1016/j.tsf.2014.03.059</a>
Alternative languages
Result language
angličtina
Original language name
Utilization of the sum rule for construction of advanced dispersion model of crystalline silicon containing interstitial oxygen
Original language description
The distribution of the total transition strength, i.e. the right hand side of the integral form of Thomas-Reiche-Kuhn sum rule, into individual absorption processes is described for crystalline silicon containing interstitial oxygen. Utilization of thesum rule allows the construction of a dispersion model covering all elementary excitations from phonon absorption to core electron excitations. The dependence of transition strength of individual electronic and phonon contributions on temperature and oxygen content is described. (C) 2014 Elsevier B.V. All rights reserved.
Czech name
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Czech description
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Classification
Type
J<sub>x</sub> - Unclassified - Peer-reviewed scientific article (Jimp, Jsc and Jost)
CEP classification
BM - Solid-state physics and magnetism
OECD FORD branch
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Result continuities
Project
Result was created during the realization of more than one project. More information in the Projects tab.
Continuities
P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)
Others
Publication year
2014
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů
Data specific for result type
Name of the periodical
Thin Solid Films
ISSN
0040-6090
e-ISSN
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Volume of the periodical
571
Issue of the periodical within the volume
november
Country of publishing house
CH - SWITZERLAND
Number of pages
6
Pages from-to
490-495
UT code for WoS article
000346055200027
EID of the result in the Scopus database
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