Characterization of Ar/N-2/H-2 middle-pressure RF discharge and application of the afterglow region for nitridation of GaAs
The result's identifiers
Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216224%3A14310%2F17%3A00098826" target="_blank" >RIV/00216224:14310/17:00098826 - isvavai.cz</a>
Result on the web
<a href="http://dx.doi.org/10.1088/1361-6463/aa9635" target="_blank" >http://dx.doi.org/10.1088/1361-6463/aa9635</a>
DOI - Digital Object Identifier
<a href="http://dx.doi.org/10.1088/1361-6463/aa9635" target="_blank" >10.1088/1361-6463/aa9635</a>
Alternative languages
Result language
angličtina
Original language name
Characterization of Ar/N-2/H-2 middle-pressure RF discharge and application of the afterglow region for nitridation of GaAs
Original language description
This work characterizes the production and destruction of nitrogen and hydrogen atoms in RF capacitively coupled middle-pressure discharge in argon/nitrogen/hydrogen mixtures. Input power, electron concentration, electric field strength and mean electron energy were determined on the basis of electrical measurements. Gas temperature and concentration of Ar atoms in 1s states were determined from spectral measurements. On the basis of experimentally determined plasma characteristics, main production and loss mechanisms of H and N atoms were discussed. The plasma produced radicals were applied for the nitridation and oxide reduction of gallium arsenide in the afterglow region of discharge. After plasma treatment the GaAs samples were analyzed using x-ray photoelectron spectroscopy (XPS) technique. Successful nitridation of GaAs sample was obtained in the case of Ar/5% N-2 discharge. In this gas mixture the N atoms were generated via dissociative recombination of N-2(+) created by charge transfer from Ar+. The treatment in Ar/5% N-2/1% H-2 mixture resulted in the reduction of oxide signals in the XPS spectra. Negligible formation of GaN in the latter mixture was connected with reduced concentration of N atoms, which was, in turn, due to less efficient mechanism of N atom production (electron impact dissociation of N-2 molecules) and additional loss channel in reaction with H-2.
Czech name
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Czech description
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Classification
Type
J<sub>imp</sub> - Article in a specialist periodical, which is included in the Web of Science database
CEP classification
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OECD FORD branch
10305 - Fluids and plasma physics (including surface physics)
Result continuities
Project
<a href="/en/project/LO1411" target="_blank" >LO1411: Development of Centre for low-cost plasma and nanotechnology surface modification</a><br>
Continuities
P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)
Others
Publication year
2017
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů
Data specific for result type
Name of the periodical
Journal of Physics D: Applied Physics
ISSN
0022-3727
e-ISSN
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Volume of the periodical
50
Issue of the periodical within the volume
50
Country of publishing house
GB - UNITED KINGDOM
Number of pages
10
Pages from-to
505201
UT code for WoS article
000415951300001
EID of the result in the Scopus database
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