Titanium Atom and Ion Number Density Evolution in Reactive High Power Impulse Magnetron Sputtering

Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216224%3A14310%2F18%3A00103779" target="_blank" >RIV/00216224:14310/18:00103779 - isvavai.cz</a>
Result on the web
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DOI - Digital Object Identifier
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Result language
angličtina
Original language name
Titanium Atom and Ion Number Density Evolution in Reactive High Power Impulse Magnetron Sputtering
Original language description
The hysteresis curve in R-HiPIMS generally exhibits a narrower shape compared to dcMS, or it can even be entirely suppressed, which is beneficial for high-rate deposition of stoichiometric compound films. However, the main effect behind the hysteresis suppression is not yet completely understood. We report on evolutions of titanium atom, and ion ground state densities in R-HiPIMS discharges in oxygen for constant mean power and pulse duration, when varying the repetition frequency.
Czech name
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Czech description
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Project
<a href="/en/project/LO1411" target="_blank" >LO1411: Development of Centre for low-cost plasma and nanotechnology surface modification</a><br>
Continuities
P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)<br>S - Specificky vyzkum na vysokych skolach<br>I - Institucionalni podpora na dlouhodoby koncepcni rozvoj vyzkumne organizace

Publication year
2018
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

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