Optical spectroscopy as a tool for visualization of sputtering plasma dynamics
The result's identifiers
Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216224%3A14310%2F18%3A00105340" target="_blank" >RIV/00216224:14310/18:00105340 - isvavai.cz</a>
Result on the web
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DOI - Digital Object Identifier
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Alternative languages
Result language
angličtina
Original language name
Optical spectroscopy as a tool for visualization of sputtering plasma dynamics
Original language description
This work combines various optical diagnostic methods for in-situ characterization of high-power impulse magnetron sputtering (HiPIMS) process. Special attention is devoted to two-dimensional visualization of the ground state sputtered atoms in the discharge volume. Laser-induced fluorescence and optical absorption spectroscopy represent two main diagnostic techniques which have been combined for the discharge diagnostics. As a result of discharge characterization the number densities as well as the particularities of propagation of the neutral and ionized sputtered Ti atoms were significantly clarified. The effects of HiPIMS plasma-on and plasma-off time duration on the Ti ionization as well as on the general evolution of density distribution in the discharge volume have been studied, demonstrating the importance of plasma pulse duration as well as the pulse energy for controlling the discharge properties.
Czech name
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Czech description
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Classification
Type
O - Miscellaneous
CEP classification
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OECD FORD branch
10305 - Fluids and plasma physics (including surface physics)
Result continuities
Project
<a href="/en/project/LO1411" target="_blank" >LO1411: Development of Centre for low-cost plasma and nanotechnology surface modification</a><br>
Continuities
P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)
Others
Publication year
2018
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů