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Optical spectroscopy as a tool for visualization of sputtering plasma dynamics

The result's identifiers

  • Result code in IS VaVaI

    <a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216224%3A14310%2F18%3A00105340" target="_blank" >RIV/00216224:14310/18:00105340 - isvavai.cz</a>

  • Result on the web

  • DOI - Digital Object Identifier

Alternative languages

  • Result language

    angličtina

  • Original language name

    Optical spectroscopy as a tool for visualization of sputtering plasma dynamics

  • Original language description

    This work combines various optical diagnostic methods for in-situ characterization of high-power impulse magnetron sputtering (HiPIMS) process. Special attention is devoted to two-dimensional visualization of the ground state sputtered atoms in the discharge volume. Laser-induced fluorescence and optical absorption spectroscopy represent two main diagnostic techniques which have been combined for the discharge diagnostics. As a result of discharge characterization the number densities as well as the particularities of propagation of the neutral and ionized sputtered Ti atoms were significantly clarified. The effects of HiPIMS plasma-on and plasma-off time duration on the Ti ionization as well as on the general evolution of density distribution in the discharge volume have been studied, demonstrating the importance of plasma pulse duration as well as the pulse energy for controlling the discharge properties.

  • Czech name

  • Czech description

Classification

  • Type

    O - Miscellaneous

  • CEP classification

  • OECD FORD branch

    10305 - Fluids and plasma physics (including surface physics)

Result continuities

  • Project

    <a href="/en/project/LO1411" target="_blank" >LO1411: Development of Centre for low-cost plasma and nanotechnology surface modification</a><br>

  • Continuities

    P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)

Others

  • Publication year

    2018

  • Confidentiality

    S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů