Highly ionized physical vapor deposition plasma source working at very low pressure
The result's identifiers
Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F68378271%3A_____%2F12%3A00377251" target="_blank" >RIV/68378271:_____/12:00377251 - isvavai.cz</a>
Alternative codes found
RIV/00216208:11320/12:10130624
Result on the web
<a href="http://dx.doi.org/10.1063/1.3699229" target="_blank" >http://dx.doi.org/10.1063/1.3699229</a>
DOI - Digital Object Identifier
<a href="http://dx.doi.org/10.1063/1.3699229" target="_blank" >10.1063/1.3699229</a>
Alternative languages
Result language
angličtina
Original language name
Highly ionized physical vapor deposition plasma source working at very low pressure
Original language description
Highly ionized discharge for physical vapor deposition at very low pressure is presented in the paper. The discharge is generated by electron cyclotron wave resonance (ECWR) which assists with ignition of high power impulse magnetron sputtering (HiPIMS)discharge. The magnetron gun (with Ti target) was built into the single-turn coil RF electrode of the ECWR facility. ECWR assistance provides pre-ionization effect which allows significant reduction of pressure during HiPIMS operation down to p=0.05 Pa;this is nearly more than an order of magnitude lower than at typical pressure ranges of HiPIMS discharges. We can confirm that nearly all sputtered particles are ionized (only Ti+ and Ti++ peaks are observed in the mass scan spectra). This corresponds well with high plasma density ne 1018m 3, measured during the HiPIMS pulse.
Czech name
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Czech description
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Classification
Type
J<sub>x</sub> - Unclassified - Peer-reviewed scientific article (Jimp, Jsc and Jost)
CEP classification
BL - Plasma physics and discharge through gases
OECD FORD branch
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Result continuities
Project
Result was created during the realization of more than one project. More information in the Projects tab.
Continuities
Z - Vyzkumny zamer (s odkazem do CEZ)
Others
Publication year
2012
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů
Data specific for result type
Name of the periodical
Applied Physics Letters
ISSN
0003-6951
e-ISSN
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Volume of the periodical
100
Issue of the periodical within the volume
14
Country of publishing house
US - UNITED STATES
Number of pages
3
Pages from-to
"141604-1"-"141604-3"
UT code for WoS article
000302567800013
EID of the result in the Scopus database
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