Investigation of ionized metal flux in enhanced high power impulse magnetron sputtering discharges
The result's identifiers
Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F68378271%3A_____%2F14%3A00439381" target="_blank" >RIV/68378271:_____/14:00439381 - isvavai.cz</a>
Alternative codes found
RIV/60076658:12310/14:43887082 RIV/00216208:11320/14:10392145
Result on the web
<a href="http://dx.doi.org/10.1063/1.4871635" target="_blank" >http://dx.doi.org/10.1063/1.4871635</a>
DOI - Digital Object Identifier
<a href="http://dx.doi.org/10.1063/1.4871635" target="_blank" >10.1063/1.4871635</a>
Alternative languages
Result language
angličtina
Original language name
Investigation of ionized metal flux in enhanced high power impulse magnetron sputtering discharges
Original language description
The metal ionized flux fraction and production of double charged metal ions Me2? of different materials (Al, Cu, Fe, Ti) by High Power Impulse Magnetron Sputtering (HiPIMS) operated with and without a pre-ionization assistance is compared in the paper. The Electron Cyclotron Wave Resonance (ECWR) discharge was employed as the pre-ionization agent providing a seed of charge in the idle time of HiPIMS pulses. A modified grid-free biased quartz crystal microbalance was used to estimate the metal ionized flux fraction n. The energy-resolved mass spectrometry served as a complementary method to distinguish particular ion contributions to the total ionized flux onto the substrate. The ratio between densities of doubly Me2? and singly Me? charged metal ions was determined. It is shown that ECWR assistance enhances Me2? production with respect of absorbed rf-power.
Czech name
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Czech description
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Classification
Type
J<sub>x</sub> - Unclassified - Peer-reviewed scientific article (Jimp, Jsc and Jost)
CEP classification
BL - Plasma physics and discharge through gases
OECD FORD branch
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Result continuities
Project
<a href="/en/project/LH12043" target="_blank" >LH12043: A Study of thin films systems based on Iron Pyrite (FeS2) for Photonic Applications.</a><br>
Continuities
I - Institucionalni podpora na dlouhodoby koncepcni rozvoj vyzkumne organizace
Others
Publication year
2014
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů
Data specific for result type
Name of the periodical
Journal of Applied Physics
ISSN
0021-8979
e-ISSN
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Volume of the periodical
115
Issue of the periodical within the volume
15
Country of publishing house
US - UNITED STATES
Number of pages
7
Pages from-to
"153301-1"-"153301-7"
UT code for WoS article
000335227100006
EID of the result in the Scopus database
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