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Low-Temperature Atmospheric Pressure Plasma for Applications in Flexible and Printed Electronics

The result's identifiers

  • Result code in IS VaVaI

    <a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216224%3A14310%2F22%3A00119220" target="_blank" >RIV/00216224:14310/22:00119220 - isvavai.cz</a>

  • Result on the web

    <a href="https://doi.org/10.1007/978-981-16-5763-4_15" target="_blank" >https://doi.org/10.1007/978-981-16-5763-4_15</a>

  • DOI - Digital Object Identifier

    <a href="http://dx.doi.org/10.1007/978-981-16-5763-4_15" target="_blank" >10.1007/978-981-16-5763-4_15</a>

Alternative languages

  • Result language

    angličtina

  • Original language name

    Low-Temperature Atmospheric Pressure Plasma for Applications in Flexible and Printed Electronics

  • Original language description

    Low-temperature plasma processing of surfaces and interfaces is an interesting option for applications in flexible and printed electronics where surface cleaning, activation or functionalization are required. Plasma processing compared to more traditional chemical treatment can be significantly cheaper and faster while eliminating the need for toxic organic solvents. Printed functional coatings often contain organic moieties from solvents, binders and other additives that tune the properties of the precursor liquid. These need to be effectively removed for optimal properties of the resulting film. Plasma can provide reactive and energetic species to the surface of printed films for post-printing processing at significantly lower temperatures compared to conventional thermal annealing. In this paper, we summarize applications of low-temperature atmospheric plasma for cleaning of indium tin oxide (ITO) and fluorine-doped tin oxide (FTO) substrates for improved interface quality between the electrode and the blocking layer in perovskite solar cells. Plasma treatment in order of seconds proved as effective as a chemical treatment for an hour. We also present a way for post-deposition mineralization of mesoporous TiO2 electron transport layer for perovskite solar cells at temperatures below 70 °C compatible with temperature-sensitive substrates.

  • Czech name

  • Czech description

Classification

  • Type

    D - Article in proceedings

  • CEP classification

  • OECD FORD branch

    10305 - Fluids and plasma physics (including surface physics)

Result continuities

  • Project

    <a href="/en/project/GJ19-14770Y" target="_blank" >GJ19-14770Y: Plasma engineering of nanostructured coatings for next-generation flexible materials</a><br>

  • Continuities

    P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)<br>I - Institucionalni podpora na dlouhodoby koncepcni rozvoj vyzkumne organizace

Others

  • Publication year

    2022

  • Confidentiality

    S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Data specific for result type

  • Article name in the collection

    Proceedings of the 2nd International Conference on Advanced Surface Enhancement (INCASE 2021)

  • ISBN

    9789811657627

  • ISSN

    2195-4356

  • e-ISSN

    2195-4364

  • Number of pages

    4

  • Pages from-to

    66-69

  • Publisher name

    Springer

  • Place of publication

    Singapore

  • Event location

    virtual (Online)

  • Event date

    Sep 7, 2021

  • Type of event by nationality

    WRD - Celosvětová akce

  • UT code for WoS article