Modelling of dcMS and HiPIMS process with hydrocarbon gas admixture

Result code in IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216224%3A14310%2F22%3A00126228" target="_blank" >RIV/00216224:14310/22:00126228 - isvavai.cz</a>

Result on the web

<a href="https://iopscience.iop.org/article/10.1088/1361-6595/ac7746" target="_blank" >https://iopscience.iop.org/article/10.1088/1361-6595/ac7746</a>

DOI - Digital Object Identifier

<a href="http://dx.doi.org/10.1088/1361-6595/ac7746" target="_blank" >10.1088/1361-6595/ac7746</a>

Result language

angličtina

Original language name

Modelling of dcMS and HiPIMS process with hydrocarbon gas admixture

Original language description

Magnetron sputtering in an argon and hydrocarbon gas mixture is a complex deposition process exhibiting features of both physical vapour deposition and plasma enhanced chemical vapour deposition. The hydrocarbon gas decomposes within the plasma and then it is able to form a carbide phase with the target metal atoms or to be deposited as amorphous carbon. In this paper, a simple model for both the direct current (dcMS) and the high power impulse magnetron sputtering (HiPIMS) processes with hydrocarbon gas admixture is presented. The sputtered target racetrack is divided into metallic, compound, and carbon fractions to take into account both the carbide formation and the carbon deposition. To simulate the HiPIMS process, the back-attraction of ionised sputtered metal particles is incorporated into the model. The model is cross-validated with the previously published experiments which were conducted using the same deposition apparatus allowing for the direct comparison of the dcMS and HiPIMS processes. The simulated results correlate with the measured dependencies of the deposition rate, the carbon content in deposited films, and the racetrack fractions on the acetylene supply rate. The presented model is further successfully validated with the evolution of the racetrack composition calculated by SDTrimSP.

Czech name

—

Czech description

—

Type

J_imp - Article in a specialist periodical, which is included in the Web of Science database

CEP classification

—

OECD FORD branch

10305 - Fluids and plasma physics (including surface physics)

Project

Result was created during the realization of more than one project. More information in the Projects tab.

Continuities

P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)

Publication year

2022

Confidentiality

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Name of the periodical

Plasma Sources Science and Technology

ISSN

0963-0252

e-ISSN

1361-6595

Volume of the periodical

31

Issue of the periodical within the volume

6

Country of publishing house

GB - UNITED KINGDOM

Number of pages

8

Pages from-to

1-8

UT code for WoS article

000818461500001

EID of the result in the Scopus database

2-s2.0-85133656194