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Study of hybrid PVD?PECVD process of Ti sputtering in argon and acetylene

The result's identifiers

  • Result code in IS VaVaI

    <a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216224%3A14310%2F11%3A00049862" target="_blank" >RIV/00216224:14310/11:00049862 - isvavai.cz</a>

  • Result on the web

  • DOI - Digital Object Identifier

Alternative languages

  • Result language

    angličtina

  • Original language name

    Study of hybrid PVD?PECVD process of Ti sputtering in argon and acetylene

  • Original language description

    Hybrid PVD?PECVD process of target sputtering in hydrocarbon containing atmosphere combines aspects of both conventional reactive magnetron sputtering (PVD) and plasma enhanced chemical vapour deposition (PECVD). Such process is being typically used fordeposition of metal carbides embedded in hydrogenated carbon matrix. Compared to the conventional co-sputtering of metal and carbon targets, in the hybrid deposition process the source of the carbon is dissociated hydrocarbon vapour in plasma. The aim ofthis paper is to study the extent of similarities or differences between this hybrid process and the conventional reactive magnetron sputtering. We have chosen the sputtering of titanium target in acetylene containing atmosphere as a representative of the hybrid processes. We focused on experimental measurements of the hybrid PVD?PECVD process behaviour, the time necessary for the process to achieve steady-state conditions and basic modelling of the process.

  • Czech name

  • Czech description

Classification

  • Type

    J<sub>x</sub> - Unclassified - Peer-reviewed scientific article (Jimp, Jsc and Jost)

  • CEP classification

    BL - Plasma physics and discharge through gases

  • OECD FORD branch

Result continuities

  • Project

    Result was created during the realization of more than one project. More information in the Projects tab.

  • Continuities

    P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)<br>Z - Vyzkumny zamer (s odkazem do CEZ)

Others

  • Publication year

    2011

  • Confidentiality

    S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Data specific for result type

  • Name of the periodical

    Surface & Coatings Technology

  • ISSN

    0257-8972

  • e-ISSN

  • Volume of the periodical

    205

  • Issue of the periodical within the volume

  • Country of publishing house

    DE - GERMANY

  • Number of pages

    4

  • Pages from-to

    "S299"-"S302"

  • UT code for WoS article

  • EID of the result in the Scopus database