Behaviour of hybrid PVD-PECVD process of Ti sputtering in argon and acetylene atmosphere
The result's identifiers
Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216224%3A14310%2F10%3A00044659" target="_blank" >RIV/00216224:14310/10:00044659 - isvavai.cz</a>
Result on the web
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DOI - Digital Object Identifier
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Alternative languages
Result language
angličtina
Original language name
Behaviour of hybrid PVD-PECVD process of Ti sputtering in argon and acetylene atmosphere
Original language description
Hybrid PVD-PECVD sputtering process was studied for the case of titanium target sputtering in argon and acetylene atmosphere. The hybrid PVD-PECVD process combines aspects of conventional sputtering of metal target with hydrocarbon vapour as a source ofcarbon. We present and discuss significant differences between behaviour of conventional reactive magnetron sputtering and such hybrid process.
Czech name
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Czech description
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Classification
Type
D - Article in proceedings
CEP classification
BL - Plasma physics and discharge through gases
OECD FORD branch
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Result continuities
Project
Result was created during the realization of more than one project. More information in the Projects tab.
Continuities
Z - Vyzkumny zamer (s odkazem do CEZ)<br>O - Projekt operacniho programu
Others
Publication year
2010
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů
Data specific for result type
Article name in the collection
Potential and Applications of Nanotretment of Medical Surface
ISBN
978-80-7372-631-7
ISSN
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e-ISSN
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Number of pages
2
Pages from-to
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Publisher name
Technical University of Liberec
Place of publication
Liberec
Event location
Liberec
Event date
Aug 30, 2010
Type of event by nationality
EUR - Evropská akce
UT code for WoS article
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