Behaviour of Hybrid PVD-PECVD Process in Comparison with Conventional Reactive Magnetron Sputtering

Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216224%3A14310%2F10%3A00045023" target="_blank" >RIV/00216224:14310/10:00045023 - isvavai.cz</a>
Result on the web
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DOI - Digital Object Identifier
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Result language
angličtina
Original language name
Behaviour of Hybrid PVD-PECVD Process in Comparison with Conventional Reactive Magnetron Sputtering
Original language description
Hybrid PVD-PECVD sputtering process was studied in comparison with conventional reactive magnetron sputtering. Titanium target was sputtered in argon plus oxygen atmosphere for conventional reactive sputtering and in argon plus acetylene for hybrid process. The hybrid PVD-PECVD combines aspects of both processes: conventional sputtering of metal target but source of carbon was hydrocarbon vapour. We report differences in behaviour of these two processes, discuss necessary time for hybrid process to achieve steady state conditions and suggest modification of Berg's model for reactive magnetron sputtering to predict behaviour of hybrid process.
Czech name
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Czech description
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Project
Result was created during the realization of more than one project. More information in the Projects tab.
Continuities
Z - Vyzkumny zamer (s odkazem do CEZ)<br>S - Specificky vyzkum na vysokych skolach

Publication year
2010
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

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