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Higher harmonic frequencies of discharge voltage and current in a capacitively coupled plasma

The result's identifiers

  • Result code in IS VaVaI

    <a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216224%3A14310%2F22%3A00135043" target="_blank" >RIV/00216224:14310/22:00135043 - isvavai.cz</a>

  • Result on the web

  • DOI - Digital Object Identifier

Alternative languages

  • Result language

    angličtina

  • Original language name

    Higher harmonic frequencies of discharge voltage and current in a capacitively coupled plasma

  • Original language description

    The current-voltage characteristics of capacitively coupled discharges has nonlinear character, which is caused by sheaths and which leads to generation of higher harmonic frequencies of discharge current and voltage. Higher harmonics are strong especially at low pressure. Higher harmonics influence the behaviour of the plasma and, at the same time, they sensitively react on number of discharge parameters, which enables to use them for monitoring of various deposition and etching processes. The presentation summarizes several topics related to higher harmonic frequencies, namely the problematics of probe measurement of the high-frequency components of plasma potential, modeling of generation of higher harmonics and analysis why higher harmonics react so sensitively on the presence of a thin film during deposition/etching processes.

  • Czech name

  • Czech description

Classification

  • Type

    O - Miscellaneous

  • CEP classification

  • OECD FORD branch

    10305 - Fluids and plasma physics (including surface physics)

Result continuities

  • Project

    <a href="/en/project/GA19-15240S" target="_blank" >GA19-15240S: Multifunctional Nanocomposite Polymer Thin Films with Controlled Surface and Mechanical Properties Deposited in RF Dusty Plasma</a><br>

  • Continuities

    P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)

Others

  • Publication year

    2022

  • Confidentiality

    S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů