Higher harmonic frequencies in a capacitively coupled plasma

Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216224%3A14310%2F21%3A00119328" target="_blank" >RIV/00216224:14310/21:00119328 - isvavai.cz</a>
Result on the web
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DOI - Digital Object Identifier
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Result language
angličtina
Original language name
Higher harmonic frequencies in a capacitively coupled plasma
Original language description
Nonlinear nature of sheaths leads to nonlinear VA characteristics and generation of higher harmonic frequencies in capacitively coupled discharges. Higher harmonic frequencies are known to influence heating of electrons, especially at low pressure, and to be very sensitive to number of discharge parameters, which enables to use higher harmonics for monitoring of various deposition and etching processes. The presentation summarizes the topic of probe measurements of higher harmonic frequencies of plasma potential, nonlinear modeling of behaviour of higher harmonic frequencies in capacitive discharges and explanation of the mechanism which leads to the sensitive reaction of higher harmonics on the presence of a deposited or etched thin film.
Czech name
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Czech description
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Project
Result was created during the realization of more than one project. More information in the Projects tab.
Continuities
P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)

Publication year
2021
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

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