Relationship Between AFM and Optical Measurements at Analyzing Surface Roughness

Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216224%3A14310%2F99%3A00002111" target="_blank" >RIV/00216224:14310/99:00002111 - isvavai.cz</a>
Result on the web
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DOI - Digital Object Identifier
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Result language
angličtina
Original language name
Relationship Between AFM and Optical Measurements at Analyzing Surface Roughness
Original language description
In this paper a comparison of the values of the basic surface roughness parameters determined by atomic force microscopy and a combined optical method is performed for a chosen sample of SiO2-film with identically randomly rough boundaries placed onto asilicon single crystal wafer. The combined optical method is based on simultaneous interpretation of the experimental data corresponding to variable angle spectroscopic ellipsometry and near-normal spectroscopic reflectometry. It is shown that the comparison of the results achieved using both the methods mentioned can be successfully performed if the influence influence of individual spatial frequencies of the harmonic components of random surface roughness on the optical quantities measured is based into account.
Czech name
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Czech description
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Type
J<sub>x</sub> - Unclassified - Peer-reviewed scientific article (Jimp, Jsc and Jost)
CEP classification
BH - Optics, masers and lasers
OECD FORD branch
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Project
Result was created during the realization of more than one project. More information in the Projects tab.
Continuities
P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)

Publication year
1999
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

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