Comparative study of electron- and photo-induced structural transformations on the surface of As35S65 amorphous thin films

Result code in IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216275%3A25310%2F08%3A00007924" target="_blank" >RIV/00216275:25310/08:00007924 - isvavai.cz</a>

Result on the web

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DOI - Digital Object Identifier

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Result language

angličtina

Original language name

Comparative study of electron- and photo-induced structural transformations on the surface of As35S65 amorphous thin films

Original language description

Change of electronic structure and chemical composition on the surface of freshly prepared As35S65 thin films caused by electron- and light irradiation have been studied by high-resolution X-ray photoelectron spectroscopy. The mechanisms of the induced transformations are compared. It is shown that light irradiation causes redistribution of chemical bonds without change in chemical composition. The products of such lightinduced structural transformations were also identified by Raman spectroscopy in thevolume of thin films. Electron irradiation changes chemical composition of the surface by creating an As-enriched layer due to the formation of As?O bonds. Anomalous increase of the ~10 eV band associated with non-bonding As 4s electrons was observed after light- and low dose e-beam irradiation.

Czech name

Srovnávací studium strukturálních změn indukovaných na povrchu tenké amorfní vrstvy As35S65 expozicí svazkem elektronů a fotony

Czech description

Metodou rentgenové fotoelektronové spektroskopie byly studovány změny elektronové struktury a chemického složení na povrchu čerstvě napařených vrstev o složení As35S65 indukované expozicí elektrony a svakem fotonů a porovnán mechanismus těchto změn..

Type

J_x - Unclassified - Peer-reviewed scientific article (Jimp, Jsc and Jost)

CEP classification

CA - Inorganic chemistry

OECD FORD branch

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Project

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Continuities

Z - Vyzkumny zamer (s odkazem do CEZ)

Publication year

2008

Confidentiality

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Name of the periodical

Thin Solid Films

ISSN

0040-6090

e-ISSN

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Volume of the periodical

516

Issue of the periodical within the volume

21

Country of publishing house

CH - SWITZERLAND

Number of pages

8

Pages from-to

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UT code for WoS article

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EID of the result in the Scopus database

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