Organoselenium Precursors for Atomic Layer Deposition
The result's identifiers
Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216275%3A25310%2F21%3A39917653" target="_blank" >RIV/00216275:25310/21:39917653 - isvavai.cz</a>
Alternative codes found
RIV/00216305:26620/21:PU142064
Result on the web
<a href="https://doi.org/10.1021/acsomega.1c00223" target="_blank" >https://doi.org/10.1021/acsomega.1c00223</a>
DOI - Digital Object Identifier
<a href="http://dx.doi.org/10.1021/acsomega.1c00223" target="_blank" >10.1021/acsomega.1c00223</a>
Alternative languages
Result language
angličtina
Original language name
Organoselenium Precursors for Atomic Layer Deposition
Original language description
Organoselenium compounds with perspective application as Se precursors for atomic layer deposition have been reviewed. The originally limited portfolio of available Se precursors such as H2Se and diethyl(di)selenide has recently been extended by bis trialkylsilyl)selenides, bis(trialkylstannyl)selenides, cyclic selenides, and tetrakis(N,N-dimethyldithiocarbamate)-selenium. Their structural aspects, property tuning, fundamental properties, and preparations are discussed. It turned out that symmetric four- and six-membered cyclic silyl selenides possess well-balanced reactivity/stability, facile and cost-effective synthesis starting from inexpensive and readily available chlorosilanes, improved resistance toward air and moisture, easy handling, sufficient volatility, thermal resistance, and complete gas-to-solid phase exchange reaction with MoCl5, affording MoSe2 nanostructures. These properties make them the most promising Se precursor developed for atomic layer deposition so far.
Czech name
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Czech description
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Classification
Type
J<sub>imp</sub> - Article in a specialist periodical, which is included in the Web of Science database
CEP classification
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OECD FORD branch
10401 - Organic chemistry
Result continuities
Project
<a href="/en/project/GA18-03881S" target="_blank" >GA18-03881S: Selenide-based 2D nanomaterials by Atomic Layer Deposition with exciting properties</a><br>
Continuities
P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)
Others
Publication year
2021
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů
Data specific for result type
Name of the periodical
ACS Omega
ISSN
2470-1343
e-ISSN
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Volume of the periodical
6
Issue of the periodical within the volume
10
Country of publishing house
US - UNITED STATES
Number of pages
5
Pages from-to
6554-6558
UT code for WoS article
000631101200005
EID of the result in the Scopus database
2-s2.0-85103489083