Utilization of As50Se50 thin films in electron beam lithography
The result's identifiers
Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216275%3A25310%2F21%3A39917666" target="_blank" >RIV/00216275:25310/21:39917666 - isvavai.cz</a>
Result on the web
<a href="https://www.sciencedirect.com/science/article/pii/S0254058420314127?via%3Dihub" target="_blank" >https://www.sciencedirect.com/science/article/pii/S0254058420314127?via%3Dihub</a>
DOI - Digital Object Identifier
<a href="http://dx.doi.org/10.1016/j.matchemphys.2020.124052" target="_blank" >10.1016/j.matchemphys.2020.124052</a>
Alternative languages
Result language
angličtina
Original language name
Utilization of As50Se50 thin films in electron beam lithography
Original language description
Chalcogenide glass of As50Se50 composition have been intensively studied for its interesting physical and chemical properties. Presented manuscript explores the applicability of As50Se50 thermally evaporated thin films in electron beam lithography exploiting wet etching in amine based solution. As50Se50 films proved to be highly sensitive negative resist. Decrease of the etching selectivity with increasing accelerating voltage and its increase with increasing exposure dose were observed. Height irregularities of prepared structures connected with the electron beam scattering and preferential etching of upper edges were observed and thoroughly studied. Comparison of photoinduced chemical resistance changes showed same trends as in case of electron beam induced changes - chemical resistance significantly increased with increasing exposure dosages.
Czech name
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Czech description
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Classification
Type
J<sub>imp</sub> - Article in a specialist periodical, which is included in the Web of Science database
CEP classification
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OECD FORD branch
20506 - Coating and films
Result continuities
Project
Result was created during the realization of more than one project. More information in the Projects tab.
Continuities
P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)<br>S - Specificky vyzkum na vysokych skolach<br>I - Institucionalni podpora na dlouhodoby koncepcni rozvoj vyzkumne organizace
Others
Publication year
2021
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů
Data specific for result type
Name of the periodical
Materials Chemistry and Physics
ISSN
0254-0584
e-ISSN
1879-3312
Volume of the periodical
259
Issue of the periodical within the volume
February
Country of publishing house
CH - SWITZERLAND
Number of pages
6
Pages from-to
124052
UT code for WoS article
000615726500005
EID of the result in the Scopus database
2-s2.0-85096417492