The Structural Modulation of Amorphous 2D Tungsten Oxide Materials in Magnetron Sputtering

Result code in IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216275%3A25310%2F22%3A39919468" target="_blank" >RIV/00216275:25310/22:39919468 - isvavai.cz</a>

Result on the web

<a href="https://onlinelibrary.wiley.com/doi/10.1002/admi.202201790" target="_blank" >https://onlinelibrary.wiley.com/doi/10.1002/admi.202201790</a>

DOI - Digital Object Identifier

<a href="http://dx.doi.org/10.1002/admi.202201790" target="_blank" >10.1002/admi.202201790</a>

Result language

angličtina

Original language name

The Structural Modulation of Amorphous 2D Tungsten Oxide Materials in Magnetron Sputtering

Original language description

2D oxide materials have gained tremendous attention in the applications. Herein, a synthesis route of 2D WO3 materials via magnetron sputtering is reported. A deposition between 2D monolayers and thin film structure are accomplished according to the temperature of substrate. And 2D monolayers are only formed on a cooled substrate. Ag doping helps to exfoliate 2D WO3 into freestanding monolayers, in which the thickness of 2D monolayer is only approximate to 3 nm. The ultralarge size of 2D WO3 shows unique features from the traditional 2D material. Resistive switching device and photocatalysis are discussed as examples of application. There is a clear intermediate resistance state in the device with 2D structure. And the failure of resistive switching device is closely related with the 2D structure of WO3. In the application of photocatalysis, an improved two-step exfoliation, achieving a stack of WO3 monolayers with a large internal volume, is utilized. The enhancements of photocatalysis are obtained with 2D WO3 after exfoliation.

Czech name

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Czech description

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Type

J_imp - Article in a specialist periodical, which is included in the Web of Science database

CEP classification

—

OECD FORD branch

10402 - Inorganic and nuclear chemistry

Project

—

Continuities

I - Institucionalni podpora na dlouhodoby koncepcni rozvoj vyzkumne organizace

Publication year

2022

Confidentiality

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Name of the periodical

Advanced Materials Interfaces

ISSN

2196-7350

e-ISSN

2196-7350

Volume of the periodical

9

Issue of the periodical within the volume

35

Country of publishing house

GB - UNITED KINGDOM

Number of pages

8

Pages from-to

2201790

UT code for WoS article

000870037600001

EID of the result in the Scopus database

2-s2.0-85140035092