Mass spectrometry and in situ x-ray photoelectron spectroscopy investigations of organometallic species induced by the etching of germanium, antimony and selenium in a methane-based plasma

Result code in IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216275%3A25310%2F23%3A39920822" target="_blank" >RIV/00216275:25310/23:39920822 - isvavai.cz</a>

Result on the web

<a href="https://iopscience.iop.org/article/10.1088/1361-6595/aceaa5/meta" target="_blank" >https://iopscience.iop.org/article/10.1088/1361-6595/aceaa5/meta</a>

DOI - Digital Object Identifier

<a href="http://dx.doi.org/10.1088/1361-6595/aceaa5" target="_blank" >10.1088/1361-6595/aceaa5</a>

Result language

angličtina

Original language name

Mass spectrometry and in situ x-ray photoelectron spectroscopy investigations of organometallic species induced by the etching of germanium, antimony and selenium in a methane-based plasma

Original language description

Organometallic positive ions were identified in inductively coupled plasmas by means of mass spectrometry during the etching of Ge, Sb, Se materials. A preliminary study was focused on identifying M (x) H (y) + (M = Ge, Sb, Se) positive ion clusters during a H-2/Ar etching process. The methane addition to the H-2/Ar mixture generates CH (x) reactive neutral species. The latter react with the metalloids within gas phase to form M (x) C (y) H (z) (+) organometallic ions. In addition, the etching of Sb2Se3 and Ge19.5Sb17.8Se62.7 bulk targets forms mixed products via ion-molecule reactions as evidenced by the presence of SeSbC (x) H (y) (+) ion clusters. Changes in surface composition induced by the newly formed organometallic structures were investigated using in situ x-ray photoelectron spectroscopy. In the case of the Ge and Sb surfaces, (M)-M-C (x) environments broadened the Ge 2p(3/2), Ge 3d, Sb 3d and Sb 4d spectra to higher values of binding energy. For the Se surface, only the hydrogen and methyl bonding could explain the important broadening of the Se 3d core level. It was found that the Ge39Se61 thin film presents an induced (Ge)-Ge-Se entity on the Ge 2p(3/2) and Ge 3d core levels.

Czech name

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Czech description

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Type

J_imp - Article in a specialist periodical, which is included in the Web of Science database

CEP classification

—

OECD FORD branch

10305 - Fluids and plasma physics (including surface physics)

Project

<a href="/en/project/GA22-05179S" target="_blank" >GA22-05179S: Infrared photonics for chemical sensors: Materials strategy based on amorphous chalcogenides</a><br>

Continuities

P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)

Publication year

2023

Confidentiality

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Name of the periodical

Plasma Sources Science and Technology

ISSN

0963-0252

e-ISSN

1361-6595

Volume of the periodical

32

Issue of the periodical within the volume

8

Country of publishing house

GB - UNITED KINGDOM

Number of pages

17

Pages from-to

085003

UT code for WoS article

001044136800001

EID of the result in the Scopus database

2-s2.0-85167873415