Ellipsometry - a tool for surface and thin film analysis

Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216305%3A26210%2F01%3APU22613" target="_blank" >RIV/00216305:26210/01:PU22613 - isvavai.cz</a>
Result on the web
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DOI - Digital Object Identifier
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Result language
angličtina
Original language name
Ellipsometry - a tool for surface and thin film analysis
Original language description
To study optical properties of solid surfaces under high temperatures we have designed an UHV apparatus consisting of an analytical chamber and a load chamber. The analytical chamber is pumped down by an ion pump to an ultimate background pressure of 10-7?10-8 Pa. Inside the chamber there is a manipulator carrying the substrate holder and oven designed for sample heating up to 1000C. The ellipsometer setup (angle of incidence is 67.5°) is fixed to two windows of the chamber. The paper deals witth a basic description of theory, design and testing of a spectroscopic ellipsometer with the light halogen source in a wavelength interval of 350-750 nm and a simple fiber optical spectrometer with a diode array as a detector (Ocean Optics S 2000).
Czech name
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Czech description
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Project
<a href="/en/project/PG98377" target="_blank" >PG98377: Ion-beam technologies and surface/thin film analysis</a><br>
Continuities
P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)<br>Z - Vyzkumny zamer (s odkazem do CEZ)

Publication year
2001
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

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