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Defect Engineering During Czochralski Crystal Growth and Silicon Wafer Manufacturing

The result's identifiers

  • Result code in IS VaVaI

    <a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216305%3A26210%2F12%3APU96660" target="_blank" >RIV/00216305:26210/12:PU96660 - isvavai.cz</a>

  • Alternative codes found

    RIV/26821532:_____/12:#0000041

  • Result on the web

  • DOI - Digital Object Identifier

Alternative languages

  • Result language

    angličtina

  • Original language name

    Defect Engineering During Czochralski Crystal Growth and Silicon Wafer Manufacturing

  • Original language description

    The chapter on the growth of single crystals of Czochralski silicon and formation and control of crystal defects in silicon. The book deals with bulk crystal growth and thin film preparation.

  • Czech name

  • Czech description

Classification

  • Type

    C - Chapter in a specialist book

  • CEP classification

    BM - Solid-state physics and magnetism

  • OECD FORD branch

Result continuities

  • Project

    <a href="/en/project/FR-TI3%2F031" target="_blank" >FR-TI3/031: Research and Development of Technologies of Manufacturing of Novel Species of Silicon Wafers</a><br>

  • Continuities

    S - Specificky vyzkum na vysokych skolach

Others

  • Publication year

    2012

  • Confidentiality

    S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Data specific for result type

  • Book/collection name

    Modern Aspects of Bulk Crystal and Thin Film Preparation

  • ISBN

    978-953-307-610-2

  • Number of pages of the result

    28

  • Pages from-to

    43-70

  • Number of pages of the book

    608

  • Publisher name

    INTECH

  • Place of publication

    Rieka, Croatia

  • UT code for WoS chapter