Optimization of Surface Texturing in the Solar Cells Production

Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216305%3A26220%2F14%3APU109453" target="_blank" >RIV/00216305:26220/14:PU109453 - isvavai.cz</a>
Result on the web
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DOI - Digital Object Identifier
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Result language
angličtina
Original language name
Optimization of Surface Texturing in the Solar Cells Production
Original language description
This article deals with implementation of the Atomic Force Microscopy (AFM) Atomic Force Microscopy to characterisation process of crystalline silicon solar cells texture. Aim of this work was to create methodology for surface evaluation in terms of optimization of texturing process in solar cells mass-production. A detailed description of surface structure is based on inspection of roughness parameters. When monitoring surface properties the AFM method has clear advantages compared to optical microscopy. Silicon substrates used in experiment were etched in strong and weak alkaline as well as in in acid solutions. Set pProcess conditions and etching solution composition affect quality of created structure very significantly ? especially texture depth,size of etched objects and amount of underetching. To obtain clear depiction of final surface structure the size of scanned area was 50 x 50 um. The shape and the depth analysis of etched objects were completed by root mean square deviati
Czech name
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Czech description
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Publication year
2014
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Article name in the collection
EDS 14 Imaps Cs International Conference Proceedings
ISBN
978-80-214-4985-5
ISSN
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e-ISSN
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Number of pages
150
Pages from-to
11-14
Publisher name
Vysoké učení technické v Brně
Place of publication
Neuveden
Event location
Brno
Event date
Jun 25, 2014
Type of event by nationality
WRD - Celosvětová akce
UT code for WoS article
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