Investigation of Contact Formation during Silicon Solar Cell Production

Result code in IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216305%3A26220%2F15%3APU115816" target="_blank" >RIV/00216305:26220/15:PU115816 - isvavai.cz</a>

Result on the web

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DOI - Digital Object Identifier

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Result language

angličtina

Original language name

Investigation of Contact Formation during Silicon Solar Cell Production

Original language description

This article deals with the investigation of the influence of sintering conditions on the formation process of screen printed contacts on passivated boron doped P+ emitters. The experiment was focused on measuring of resistance changes of two thick filmpastes during firing processes with different conditions. Two different temperature profiles were compared at an atmospheric concentration of O2. The influence of the O2 concentration on resistance was investigated for one profile. A rapid thermal processing furnace modified for in-situ resistance measurements was used. The change of resistance was measured simultaneously with the temperature

Czech name

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Czech description

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Type

D - Article in proceedings

CEP classification

JA - Electronics and optoelectronics

OECD FORD branch

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Project

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Continuities

S - Specificky vyzkum na vysokych skolach

Publication year

2015

Confidentiality

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Article name in the collection

IMAPS Flash conference 2015

ISBN

978-80-214-5270-1

ISSN

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e-ISSN

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Number of pages

2

Pages from-to

19-20

Publisher name

Neuveden

Place of publication

Brno

Event location

Brno

Event date

Oct 15, 2015

Type of event by nationality

EUR - Evropská akce

UT code for WoS article

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