Modelling of Magnetron TiN Deposition Using the Design of Experiment

Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216305%3A26220%2F21%3APU132633" target="_blank" >RIV/00216305:26220/21:PU132633 - isvavai.cz</a>
Result on the web
<a href="https://link.springer.com/chapter/10.1007/978-3-030-61659-5_6" target="_blank" >https://link.springer.com/chapter/10.1007/978-3-030-61659-5_6</a>
DOI - Digital Object Identifier
<a href="http://dx.doi.org/10.1007/978-3-030-61659-5_6" target="_blank" >10.1007/978-3-030-61659-5_6</a>

Result language
angličtina
Original language name
Modelling of Magnetron TiN Deposition Using the Design of Experiment
Original language description
The aim of this study was to find the optimal settings of magnetron sputtering deposition of thin titanium nitride layers with respect to the size and hardness of the deposited layer. Direct sputtering deposition of the ceramic target using a radiofrequency source was used for magnetron sputtering deposition. The advantage of this method is easier finding of optimal deposition parameters. X-ray reflectometry was used to characterize the coating in terms of thickness. The hardness was determined by the Berkovich tip. To optimize the thickness and hardness of the TiN coating, a rotatable central composite design of response area for pressure and performance was used. Using only statistically significant fac-tors, mathematical models of thickness and hardness of TiN coating were con-structed. Based on these mathematical models, the optimal settings of statistically significant TiN magnetron deposition factors were found.
Czech name
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Czech description
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Type
C - Chapter in a specialist book
CEP classification
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OECD FORD branch
10302 - Condensed matter physics (including formerly solid state physics, supercond.)

Publication year
2021
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

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