Novel method of reactive magnetron sputtering process control
The result's identifiers
Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216224%3A14310%2F13%3A00066349" target="_blank" >RIV/00216224:14310/13:00066349 - isvavai.cz</a>
Result on the web
—
DOI - Digital Object Identifier
—
Alternative languages
Result language
angličtina
Original language name
Novel method of reactive magnetron sputtering process control
Original language description
Novel method of control of reactive magnetron sputtering process is presented. To control reactive magnetron sputtering process the process pressure is regulated by the flow of the reactive gas (nitrogen). Oscillations of the flow of the reactive gas aredetermined and used as feedback to find the right overall pressure, where stoichiometric coating is deposited. To see typical process behavior, see fig. 1. Proposed method of control was used for deposition of several coatings (TiN, AlTiN, AlCrN, CrTiN)on industrial scale central rotating unbalanced magnetron. To achieve superior adhesion of these layers, novel cleaning method called LGD was used. These coatings were used in industrial applications. Applications results in comparison with market standard coatings will be presented along with other measurements of deposited layers (EDX, SIMS, SEM).
Czech name
—
Czech description
—
Classification
Type
O - Miscellaneous
CEP classification
BL - Plasma physics and discharge through gases
OECD FORD branch
—
Result continuities
Project
Result was created during the realization of more than one project. More information in the Projects tab.
Continuities
P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)
Others
Publication year
2013
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů