New perspectives of plasma polymerization
The result's identifiers
Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216305%3A26310%2F05%3APU52903" target="_blank" >RIV/00216305:26310/05:PU52903 - isvavai.cz</a>
Result on the web
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DOI - Digital Object Identifier
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Alternative languages
Result language
angličtina
Original language name
New perspectives of plasma polymerization
Original language description
We would like to introduce plasma polymerization as a technique capable to prepare high quality thin films with high reproducibility. This level of technology could enable us to deal with more complicated film systems - multilayers and gradient films. Ingeneral, multilayer films can be prepared using the fabrication "bottom-up". Thus, a nanostructured film can be prepared as layer-by-layer, where the film thickness of a single layer could be only several tens of nanometers and single layers have to be bonded each other using strong chemical bonds. We could construct a functionally gradient nanostructured film "without" interfaces in one deposition if the plasma technology would be able to prepare film of continuously varying properties. Such a nanote chnology could be worth for formation of the controlled interphase in multicomponent materials, transparent nanostructured films of the varying refractive index - valuable as materials for optoelectronic applications, and functionally dope
Czech name
Nové perspektivy plazmové polymerace
Czech description
Příspěvek se zybývá mapováním současných možností plazmové polymerace a výhledem na další vývoj tohoto oboru.
Classification
Type
J<sub>x</sub> - Unclassified - Peer-reviewed scientific article (Jimp, Jsc and Jost)
CEP classification
JI - Composite materials
OECD FORD branch
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Result continuities
Project
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Continuities
Z - Vyzkumny zamer (s odkazem do CEZ)
Others
Publication year
2005
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů
Data specific for result type
Name of the periodical
Chemické listy (IF = 0.348)
ISSN
0009-2770
e-ISSN
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Volume of the periodical
99
Issue of the periodical within the volume
Symposia
Country of publishing house
CZ - CZECH REPUBLIC
Number of pages
4
Pages from-to
367-370
UT code for WoS article
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EID of the result in the Scopus database
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