Fragmentation of Tetravinyl Silane in Pulsed RF Discharge

Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216305%3A26310%2F09%3APU83914" target="_blank" >RIV/00216305:26310/09:PU83914 - isvavai.cz</a>
Result on the web
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DOI - Digital Object Identifier
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Result language
angličtina
Original language name
Fragmentation of Tetravinyl Silane in Pulsed RF Discharge
Original language description
The tetravinylsilane fragmentation was studied in pulsed regime of RF discharge by optical emission spectroscopy. Some simple fragments were recognized. The emission intensities of these fragments were strongly dependent on the duty cycle of the discharge. The electron and rotational temperatures were calculated from the spectra and both of them also depended on the duty cycle. The determined electron temperature of about 3500 K was very low in comparison to the energy needed for the tetravinylsilane fragmentation (about 10 eV) and only a few electrons had sufficient energy for the fragmentation. Thus we suppose that excited states play a significant role in the fragmentation process.
Czech name
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Czech description
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Publication year
2009
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Article name in the collection
Proceedings of 17th Symposium on Application of Plasma Processes
ISBN
978-80-89186-45-7
ISSN
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e-ISSN
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Number of pages
2
Pages from-to
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Publisher name
UK Bratislava
Place of publication
Bratislava
Event location
Liptovský Ján
Event date
Jan 23, 2009
Type of event by nationality
EUR - Evropská akce
UT code for WoS article
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