Spectroscopy of Plasma Deposition Processes Using Dimethylphenylsilane Precursor

Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216305%3A26310%2F11%3APU90913" target="_blank" >RIV/00216305:26310/11:PU90913 - isvavai.cz</a>
Result on the web
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DOI - Digital Object Identifier
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Result language
angličtina
Original language name
Spectroscopy of Plasma Deposition Processes Using Dimethylphenylsilane Precursor
Original language description
The inductively coupled low pressure plasma operating in continuous as well as in pulsed mode was used for the experiments. The aim of the presented experiment was to study the dimethylphenylsilane (DMPS) fragmentation, and the influence of set-up parameters on the deposition process. Fragments of DMPS were identified by optical emission spectroscopy. Dependences of fragment populations on supplied power as well as on DMPS pressure were determined, and consequently, the electron and rotational temperatures were calculated. Some optimal values of set-up parameters as DMPS pressure and duty cycle were found.
Czech name
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Czech description
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Project
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Continuities
Z - Vyzkumny zamer (s odkazem do CEZ)<br>S - Specificky vyzkum na vysokych skolach

Publication year
2011
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Article name in the collection
Book of Contributed Papers: 18th Symposium on Application of Plasma Processes and Workshop on Plasmas as a Planetary Atmospheres Mimics
ISBN
978-80-89186-77-8
ISSN
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e-ISSN
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Number of pages
5
Pages from-to
247-251
Publisher name
Neuveden
Place of publication
Bratislava
Event location
Vrátna
Event date
Jan 15, 2011
Type of event by nationality
EUR - Evropská akce
UT code for WoS article
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