Wettability of plasma-polymerized vinyltriethoxysilane film

Result code in IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216305%3A26310%2F09%3APU84406" target="_blank" >RIV/00216305:26310/09:PU84406 - isvavai.cz</a>

Result on the web

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DOI - Digital Object Identifier

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Result language

angličtina

Original language name

Wettability of plasma-polymerized vinyltriethoxysilane film

Original language description

Plasma-polymerized films of vinyltriethoxysilane were surface characterized using the sessile drop technique. The surface free energy and its components were evaluated using the Owens-Wendt-Kaelble geometric mean method, Wu harmonic mean method, and vanOss, Chaudhury, and Good acid-base theory. An influence of deposition conditions on the surface free energy was demonstrated in the study. An improved wettability of films was related to the diminished concentration of apolar methyl groups in plasma polymer. An increased concentration of carbonyl and hydroxyl groups resulted in very small improvement of the polar component.

Czech name

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Czech description

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Type

J_x - Unclassified - Peer-reviewed scientific article (Jimp, Jsc and Jost)

CEP classification

CF - Physical chemistry and theoretical chemistry

OECD FORD branch

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Project

Result was created during the realization of more than one project. More information in the Projects tab.

Continuities

Z - Vyzkumny zamer (s odkazem do CEZ)

Publication year

2009

Confidentiality

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Name of the periodical

Chemical Papers

ISSN

0366-6352

e-ISSN

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Volume of the periodical

63

Issue of the periodical within the volume

4

Country of publishing house

SK - SLOVAKIA

Number of pages

5

Pages from-to

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UT code for WoS article

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EID of the result in the Scopus database

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