Plasma-enhanced chemical vapor deposition of nanocomposite thin films
The result's identifiers
Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216305%3A26310%2F10%3APU90079" target="_blank" >RIV/00216305:26310/10:PU90079 - isvavai.cz</a>
Result on the web
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DOI - Digital Object Identifier
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Alternative languages
Result language
angličtina
Original language name
Plasma-enhanced chemical vapor deposition of nanocomposite thin films
Original language description
The deposited films at a power of 10 W (self-bias 120 V) were of grain structure with a diameter of grains 20-100 nm. The diameter of some grains increased up to 0.5 micron with en-hanced power at an expense of smaller ones, whose magnitude decreased.
Czech name
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Czech description
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Classification
Type
O - Miscellaneous
CEP classification
CF - Physical chemistry and theoretical chemistry
OECD FORD branch
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Result continuities
Project
Result was created during the realization of more than one project. More information in the Projects tab.
Continuities
P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)
Others
Publication year
2010
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů