Nanocomposite thin films synthesized by plasma nanotechnology
The result's identifiers
Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216305%3A26310%2F11%3APU96925" target="_blank" >RIV/00216305:26310/11:PU96925 - isvavai.cz</a>
Result on the web
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DOI - Digital Object Identifier
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Alternative languages
Result language
angličtina
Original language name
Nanocomposite thin films synthesized by plasma nanotechnology
Original language description
Thin amorphous films with incorporated grains of different mechanical properties can be synthesized simultaneously from tetravinylsilane monomer using plasma-enhanced chemical vapor deposition (PECVD). Thin films in a form of hydrogenated amorphous carbon-silicon (a-SiC:H) alloy of thickness from 25 nm to 1 micron were deposited at an RF power ranging from 10 to 70 W (self-bias 120-680 V) and a mass flow rate of 3.8 sccm (3.0 Pa). The films synthesized at a power of 10 W (120 V) were of grain structurewith a diameter of grains about 29 nm. The diameter of some grains increased up to 0.5 micron with enhanced power at an expense of smaller ones, whose magnitude decreased. The bigger grains formed isolated islands in a relatively smooth matrix at a powerof 50 W (530 V) and the density of bigger grains increased forming agglomerates at a power of 70 W (680 V). The grain structure of all the films was extensively investigated by atomic force microscopy (AFM) using height, magnitude, phase
Czech name
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Czech description
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Classification
Type
O - Miscellaneous
CEP classification
CF - Physical chemistry and theoretical chemistry
OECD FORD branch
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Result continuities
Project
Result was created during the realization of more than one project. More information in the Projects tab.
Continuities
P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)
Others
Publication year
2011
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů