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Mechanical properties of individual layers in a-SiC:H multilayer film

The result's identifiers

  • Result code in IS VaVaI

    <a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216305%3A26310%2F11%3APU96913" target="_blank" >RIV/00216305:26310/11:PU96913 - isvavai.cz</a>

  • Result on the web

  • DOI - Digital Object Identifier

Alternative languages

  • Result language

    angličtina

  • Original language name

    Mechanical properties of individual layers in a-SiC:H multilayer film

  • Original language description

    Hydrogenated amorphous carbon-silicon (a-SiC:H) multilayer film consisting of five soft bilayers (layer A: E=15.4 GPa, H=1.69 GPa; layer B: E=9.63 GPa, H=0.94 GPa) was deposited from tetravinylsilane monomer at two RF powers (10 W, 0.1 W) on silicon wafer by plasma-enhanced chemical vapor deposition. The multilayer comprising ten layers of 0.13-micron thickness was sectioned at a shallow angle of 4 deg by ultramicrotomy to reveal the individual layers. The layers in the multilayer film were distinguished by the surface topography mode of semicontact atomic force microscopy utilizing the step character in height corresponding to the stiffness of the individual layers and by atomic force acoustic microscopy (AFAM) utilizing the distribution of resonant frequencies corresponding to elastic anisotropy. The sectioned individual layers were sufficiently smooth (RMS roughness: 0.001 micron) to make nanoindentation measurements for each layer. The Youngs modulus E and hardness H were determine

  • Czech name

  • Czech description

Classification

  • Type

    J<sub>x</sub> - Unclassified - Peer-reviewed scientific article (Jimp, Jsc and Jost)

  • CEP classification

    CF - Physical chemistry and theoretical chemistry

  • OECD FORD branch

Result continuities

  • Project

    Result was created during the realization of more than one project. More information in the Projects tab.

  • Continuities

    P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)

Others

  • Publication year

    2011

  • Confidentiality

    S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Data specific for result type

  • Name of the periodical

    Plasma Processes and Polymers

  • ISSN

    1612-8850

  • e-ISSN

  • Volume of the periodical

    8

  • Issue of the periodical within the volume

    12

  • Country of publishing house

    DE - GERMANY

  • Number of pages

    9

  • Pages from-to

    1107-1115

  • UT code for WoS article

  • EID of the result in the Scopus database