STUDY OF THIN-FILM SURFACES
The result's identifiers
Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216305%3A26310%2F11%3APU96927" target="_blank" >RIV/00216305:26310/11:PU96927 - isvavai.cz</a>
Result on the web
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DOI - Digital Object Identifier
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Alternative languages
Result language
angličtina
Original language name
STUDY OF THIN-FILM SURFACES
Original language description
The doctoral thesis deals with the study of surface properties of single-layer and multilayer thin films deposited from of vinyltriethoxysilane and tetravinylsilane monomers. It also deals with adhesion characterization of single layer tetravinylsilane films. The plasma polymerized thin films were prepared under steady-state deposition conditions on polished silicon wafers using plasma-enhanced chemical vapor deposition. The surface properties of the films were been characterized by different scanning probe microscopy methods and nanoindentation techniques such as conventional depth-sensing nanoindentation and load-partialunload (cyclic) nanoindentation. While, the nanoscratch test was used to characterize the film adhesion properties. Single layer films prepared at different deposition conditions were characterized with respect to surface morphology and mechanical properties (Youngs modulus and hardness). The results of surface morphology, grain analysis, nanoindentation, finite eleme
Czech name
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Czech description
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Classification
Type
O - Miscellaneous
CEP classification
CF - Physical chemistry and theoretical chemistry
OECD FORD branch
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Result continuities
Project
Result was created during the realization of more than one project. More information in the Projects tab.
Continuities
P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)
Others
Publication year
2011
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů