Correlation between mechanical, optical and chemical properties of thin films deposited by PECVD

Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216305%3A26310%2F08%3APU77699" target="_blank" >RIV/00216305:26310/08:PU77699 - isvavai.cz</a>
Result on the web
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DOI - Digital Object Identifier
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Result language
angličtina
Original language name
Correlation between mechanical, optical and chemical properties of thin films deposited by PECVD
Original language description
Plasma-polymerized films of vinyltriethoxysilane were prepared by plasma-enhanced chemical vapor deposition using an RF (13.56 MHz) helical coupling plasma system operated in a pulsed regime. Thin films deposited under the same deposition conditions butwith different thicknesses (9.5 nm - 10.5 micron) were analyzed with respect to mechanical, optical, and chemical properties. All the films exhibited a layered structure. The overlayer at the film surface with a thickness (0.9 - 34 nm) dependent on the sample thickness was revealed by AFM, nanoindentation, and ellipsometry. A gradient behavior of the refractive index and the Young's modulus within the overlayer was related to the surface morphology of the films. A gradient interlayer at the substrate was also discussed.
Czech name
Korelace mezi mechanickými, optickými a chemickými vlastnostmi tenkých vrstev deponovaných PECVD
Czech description
Korelace mezi mechanickými, optickými a chemickými vlastnostmi tenkých vrstev deponovaných PECVD

Type
J<sub>x</sub> - Unclassified - Peer-reviewed scientific article (Jimp, Jsc and Jost)
CEP classification
CF - Physical chemistry and theoretical chemistry
OECD FORD branch
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Project
Result was created during the realization of more than one project. More information in the Projects tab.
Continuities
P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)

Publication year
2008
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

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