Deposition of Single Plasma-Polymerized Vinyltriethoxysilane Films and their Layered Structure

Result code in IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216305%3A26310%2F06%3APU63486" target="_blank" >RIV/00216305:26310/06:PU63486 - isvavai.cz</a>

Result on the web

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DOI - Digital Object Identifier

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Result language

angličtina

Original language name

Deposition of Single Plasma-Polymerized Vinyltriethoxysilane Films and their Layered Structure

Original language description

Plasma polymer films of vinyltriethoxysilane were prepared at the same deposition conditions but different film thicknesses and analyzed with respect to deposition rate, surface morphology and selected mechanical properties. The mean deposition rate decreased from 190 to 105 nm min-1 and the RMS roughness increased from 0.1 to 17.5 nm with film thickness ranging from 15.8 nm to 8.4 _m. The RMS roughness correlated to film thickness and the roughening coefficient was 0.92. Depth profiles of the elastic modulus and hardness revealed the gradient character of the films with thickness of up to 0.5 _m and a layered structure of a thicker film. Results enabled the reconstruction of a thicker film (> 0.5 _m) as the layered structure, which consists of a gradient interlayer at the substrate, a relatively homogeneous layer as the bulk, and gradient overlayer at the film surface.

Czech name

Depozice plazmových polymerů a jejich vrstevnatá struktura

Czech description

Analýza mechanických vlastností tenkých vrstev plazmových polymerů odhalila gradientní a vrstevnatý charakter filmů.

Type

J_x - Unclassified - Peer-reviewed scientific article (Jimp, Jsc and Jost)

CEP classification

CF - Physical chemistry and theoretical chemistry

OECD FORD branch

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Project

Result was created during the realization of more than one project. More information in the Projects tab.

Continuities

P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)

Publication year

2006

Confidentiality

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Name of the periodical

Japanese Journal of Applied Physics

ISSN

0021-4922

e-ISSN

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Volume of the periodical

45

Issue of the periodical within the volume

10B

Country of publishing house

JP - JAPAN

Number of pages

5

Pages from-to

8440-8444

UT code for WoS article

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EID of the result in the Scopus database

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