Protection by Deposition of Parylene and SiOx Thin Films
The result's identifiers
Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216305%3A26310%2F12%3APU101725" target="_blank" >RIV/00216305:26310/12:PU101725 - isvavai.cz</a>
Result on the web
—
DOI - Digital Object Identifier
—
Alternative languages
Result language
angličtina
Original language name
Protection by Deposition of Parylene and SiOx Thin Films
Original language description
This study focuses on possibilities of the archaeological artefacts (copper, iron, brass and bronze) protection by a thin film deposition of SiOx and Parylene thin films. Parylene coatings are prepared by the standard chemical vapor deposition (CVD) method. SiOx layers were deposited by PECVD in a low pressure reactor with capacitively coupled plasma discharge (13.56 MHz). The coatings were characterized by various methods in order to obtain information about their chemical structure (FTIR) and elemental composition (XPS), surface morphology (SEM) and barrier properties (OTR).
Czech name
—
Czech description
—
Classification
Type
D - Article in proceedings
CEP classification
BL - Plasma physics and discharge through gases
OECD FORD branch
—
Result continuities
Project
<a href="/en/project/GD104%2F09%2FH080" target="_blank" >GD104/09/H080: Plasmachemical processes and their technological applications</a><br>
Continuities
S - Specificky vyzkum na vysokych skolach
Others
Publication year
2012
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů
Data specific for result type
Article name in the collection
Potential and Applications of Surface Nanotreatment of Polymers and Glass - Book of Abstracts
ISBN
978-80-210-5979-5
ISSN
—
e-ISSN
—
Number of pages
3
Pages from-to
32-34
Publisher name
Neuveden
Place of publication
Brno
Event location
Hustopeče
Event date
Oct 15, 2012
Type of event by nationality
EUR - Evropská akce
UT code for WoS article
—