Protection by Deposition of Parylene and SiOx Thin Layers
The result's identifiers
Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216305%3A26310%2F12%3APU105249" target="_blank" >RIV/00216305:26310/12:PU105249 - isvavai.cz</a>
Result on the web
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DOI - Digital Object Identifier
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Alternative languages
Result language
angličtina
Original language name
Protection by Deposition of Parylene and SiOx Thin Layers
Original language description
The aim of this work is protection of archaeological artefacts due to the thin films of parylene and SiOx. Thin films of parylene were prepared by CVD technique and SiOx thin films were prepared by PECVD. This thin films were characterized by various methods, for example by SEM, OTR, XPS and FTIR.
Czech name
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Czech description
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Classification
Type
O - Miscellaneous
CEP classification
AC - Archaeology, anthropology, ethnology
OECD FORD branch
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Result continuities
Project
<a href="/en/project/GD104%2F09%2FH080" target="_blank" >GD104/09/H080: Plasmachemical processes and their technological applications</a><br>
Continuities
P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)
Others
Publication year
2012
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů