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Protection by Deposition of Parylene and SiOx Thin Layers

The result's identifiers

  • Result code in IS VaVaI

    <a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216305%3A26310%2F12%3APU105249" target="_blank" >RIV/00216305:26310/12:PU105249 - isvavai.cz</a>

  • Result on the web

  • DOI - Digital Object Identifier

Alternative languages

  • Result language

    angličtina

  • Original language name

    Protection by Deposition of Parylene and SiOx Thin Layers

  • Original language description

    The aim of this work is protection of archaeological artefacts due to the thin films of parylene and SiOx. Thin films of parylene were prepared by CVD technique and SiOx thin films were prepared by PECVD. This thin films were characterized by various methods, for example by SEM, OTR, XPS and FTIR.

  • Czech name

  • Czech description

Classification

  • Type

    O - Miscellaneous

  • CEP classification

    AC - Archaeology, anthropology, ethnology

  • OECD FORD branch

Result continuities

  • Project

    <a href="/en/project/GD104%2F09%2FH080" target="_blank" >GD104/09/H080: Plasmachemical processes and their technological applications</a><br>

  • Continuities

    P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)

Others

  • Publication year

    2012

  • Confidentiality

    S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů