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Temperature effect on Al predose and AlN nucleation affecting the buffer layer performance for the GaN-on-Si based high-voltage devices

The result's identifiers

  • Result code in IS VaVaI

    <a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216305%3A26620%2F19%3APU132237" target="_blank" >RIV/00216305:26620/19:PU132237 - isvavai.cz</a>

  • Result on the web

    <a href="https://iopscience.iop.org/article/10.7567/1347-4065/ab0d00/meta" target="_blank" >https://iopscience.iop.org/article/10.7567/1347-4065/ab0d00/meta</a>

  • DOI - Digital Object Identifier

    <a href="http://dx.doi.org/10.7567/1347-4065/ab0d00" target="_blank" >10.7567/1347-4065/ab0d00</a>

Alternative languages

  • Result language

    angličtina

  • Original language name

    Temperature effect on Al predose and AlN nucleation affecting the buffer layer performance for the GaN-on-Si based high-voltage devices

  • Original language description

    An AlN buffer layer allows epitaxial growth of GaN on silicon substrates. We have studied the early AlN nucleation stage performed at high and low process temperatures. We show that the temperature has a crucial effect on the chemical reactions on the Si substrate during the initial growth stage. We have observed that large clustered defects are formed at 1000 °C. These defects are responsible for degradation of the vertical leakage current (VLC) blocking capability of the buffer layer. Formation of the defects is prevented if the temperature is lowered to 800 °C, which is explained by a carbonization of the Si surface. Formation of the SiC interlayer leads to the stable AlN/Si(111) interface during subsequent hightemperature growth of the buffer structure. We demonstrate that very low VLCs in superlattice-based buffer are achieved using the lowtemperature nucleation process, which makes it suitable for fabrication of high voltage AlGaN/GaN high electron mobility transistor devices.

  • Czech name

  • Czech description

Classification

  • Type

    J<sub>imp</sub> - Article in a specialist periodical, which is included in the Web of Science database

  • CEP classification

  • OECD FORD branch

    10302 - Condensed matter physics (including formerly solid state physics, supercond.)

Result continuities

  • Project

    Result was created during the realization of more than one project. More information in the Projects tab.

  • Continuities

    P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)

Others

  • Publication year

    2019

  • Confidentiality

    S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Data specific for result type

  • Name of the periodical

    Japanese Journal of Applied Physics

  • ISSN

    0021-4922

  • e-ISSN

    1347-4065

  • Volume of the periodical

    58

  • Issue of the periodical within the volume

    SC

  • Country of publishing house

    JP - JAPAN

  • Number of pages

    9

  • Pages from-to

    „SC1018-1“-„SC1018-9“

  • UT code for WoS article

    000474911400025

  • EID of the result in the Scopus database