Temperature effect on Al predose and AlN nucleation affecting the buffer layer performance for the GaN-on-Si based high-voltage devices
The result's identifiers
Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216305%3A26620%2F19%3APU132237" target="_blank" >RIV/00216305:26620/19:PU132237 - isvavai.cz</a>
Result on the web
<a href="https://iopscience.iop.org/article/10.7567/1347-4065/ab0d00/meta" target="_blank" >https://iopscience.iop.org/article/10.7567/1347-4065/ab0d00/meta</a>
DOI - Digital Object Identifier
<a href="http://dx.doi.org/10.7567/1347-4065/ab0d00" target="_blank" >10.7567/1347-4065/ab0d00</a>
Alternative languages
Result language
angličtina
Original language name
Temperature effect on Al predose and AlN nucleation affecting the buffer layer performance for the GaN-on-Si based high-voltage devices
Original language description
An AlN buffer layer allows epitaxial growth of GaN on silicon substrates. We have studied the early AlN nucleation stage performed at high and low process temperatures. We show that the temperature has a crucial effect on the chemical reactions on the Si substrate during the initial growth stage. We have observed that large clustered defects are formed at 1000 °C. These defects are responsible for degradation of the vertical leakage current (VLC) blocking capability of the buffer layer. Formation of the defects is prevented if the temperature is lowered to 800 °C, which is explained by a carbonization of the Si surface. Formation of the SiC interlayer leads to the stable AlN/Si(111) interface during subsequent hightemperature growth of the buffer structure. We demonstrate that very low VLCs in superlattice-based buffer are achieved using the lowtemperature nucleation process, which makes it suitable for fabrication of high voltage AlGaN/GaN high electron mobility transistor devices.
Czech name
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Czech description
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Classification
Type
J<sub>imp</sub> - Article in a specialist periodical, which is included in the Web of Science database
CEP classification
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OECD FORD branch
10302 - Condensed matter physics (including formerly solid state physics, supercond.)
Result continuities
Project
Result was created during the realization of more than one project. More information in the Projects tab.
Continuities
P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)
Others
Publication year
2019
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů
Data specific for result type
Name of the periodical
Japanese Journal of Applied Physics
ISSN
0021-4922
e-ISSN
1347-4065
Volume of the periodical
58
Issue of the periodical within the volume
SC
Country of publishing house
JP - JAPAN
Number of pages
9
Pages from-to
„SC1018-1“-„SC1018-9“
UT code for WoS article
000474911400025
EID of the result in the Scopus database
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