The combined study of the organosilicon films by RBS, ERDA and AFM analytical methods obtained from PECVD and PACVD
The result's identifiers
Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F44555601%3A13430%2F04%3A00002694" target="_blank" >RIV/44555601:13430/04:00002694 - isvavai.cz</a>
Result on the web
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DOI - Digital Object Identifier
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Alternative languages
Result language
angličtina
Original language name
The combined study of the organosilicon films by RBS, ERDA and AFM analytical methods obtained from PECVD and PACVD
Original language description
Organosilicon plasma deposited polymers are of interest for different kinds of applications like packaging, passivation and dielectric layers. A large set of plasma processes is possible, among which are low-pressure plasma enhanced chemical vapour deposition (PECVD) and plasma assisted chemical vapour deposition (PACVD) often used. In this work, we studied the composition and surface morphology of the hexamethyldisiloxane (HMDSO) and tetramethyldisoloxane (TMDSO) layers produced by PECVD and PACVD deposition using three plasma generation processes (plasma reactors): RF inductively coupled plasma (RFICP), microwave distributed electron cyclotron resonance plasma (DECR) and microwave induced remote nitrogen afterlow (MIRA). The layers composition was investigated by Rutherford backscattering spectrometry (RBS) and by elastic recoil detection analysis (ERDA) and the layer surface morphology was determined by atomic force microscopy (AFM). Composition, density and morphology (roughness, p
Czech name
Komplexní studium vrstev připravených metodami PECVD a PACVD analytickými metodami RBS, ERDA a AFM.
Czech description
Byla zkoumána role parametrů během depozice především teploty substrátu na růst křemíkových vrstev. Druhá část prezentovaných výsledků se týkala studia morfologie a složení vrstev připravených několika typy plasmatických reaktorů. Vrstvy byly studovány jadernými analytickými metodami RBS, ERDA a rovněž AFM. Morfologie, složení vrstev a jejich vlastnosti byly diskutovány ve spojitosti s použitím různých typů plasmatických reaktorů.
Classification
Type
J<sub>x</sub> - Unclassified - Peer-reviewed scientific article (Jimp, Jsc and Jost)
CEP classification
BL - Plasma physics and discharge through gases
OECD FORD branch
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Result continuities
Project
<a href="/en/project/OC%20527.50" target="_blank" >OC 527.50: Polymer Thin Films Study by AFM and Improvement of Plasma Diagnostics Methods</a><br>
Continuities
P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)
Others
Publication year
2004
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů
Data specific for result type
Name of the periodical
Surface Science
ISSN
0039-6028
e-ISSN
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Volume of the periodical
566-568
Issue of the periodical within the volume
2
Country of publishing house
NL - THE KINGDOM OF THE NETHERLANDS
Number of pages
4
Pages from-to
1143-1146
UT code for WoS article
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EID of the result in the Scopus database
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