PECVD of nanostructured SiO2 in a modulated microwave plasma jet at atmospheric pressure
The result's identifiers
Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216224%3A14310%2F13%3A00068976" target="_blank" >RIV/00216224:14310/13:00068976 - isvavai.cz</a>
Result on the web
<a href="http://dx.doi.org/10.1088/0022-3727/46/33/335202" target="_blank" >http://dx.doi.org/10.1088/0022-3727/46/33/335202</a>
DOI - Digital Object Identifier
<a href="http://dx.doi.org/10.1088/0022-3727/46/33/335202" target="_blank" >10.1088/0022-3727/46/33/335202</a>
Alternative languages
Result language
angličtina
Original language name
PECVD of nanostructured SiO2 in a modulated microwave plasma jet at atmospheric pressure
Original language description
We performed the thin films deposition using atmospheric pressure plasma enhanced chemical vapour deposition (AP-PECVD) by means of a microwave plasma jet operating with mixtures of argon and tetrakis(trimethylsilyloxy)silane (TTMS).
Czech name
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Czech description
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Classification
Type
J<sub>x</sub> - Unclassified - Peer-reviewed scientific article (Jimp, Jsc and Jost)
CEP classification
BL - Plasma physics and discharge through gases
OECD FORD branch
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Result continuities
Project
Result was created during the realization of more than one project. More information in the Projects tab.
Continuities
P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)
Others
Publication year
2013
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů
Data specific for result type
Name of the periodical
J. Phys. D: Appl. Phys.
ISSN
0022-3727
e-ISSN
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Volume of the periodical
46
Issue of the periodical within the volume
33
Country of publishing house
GB - UNITED KINGDOM
Number of pages
8
Pages from-to
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UT code for WoS article
000322784200010
EID of the result in the Scopus database
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