Gas aggregation nanocluster source ? Reactive sputter deposition of copper and titanium nanoclusters

Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F45309787%3A_____%2F11%3A%230000003" target="_blank" >RIV/45309787:_____/11:#0000003 - isvavai.cz</a>
Result on the web
<a href="http://www.sciencedirect.com/science/article/pii/S0257897210012776" target="_blank" >http://www.sciencedirect.com/science/article/pii/S0257897210012776</a>
DOI - Digital Object Identifier
<a href="http://dx.doi.org/10.1016/j.surfcoat.2010.12.027" target="_blank" >10.1016/j.surfcoat.2010.12.027</a>

Result language
angličtina
Original language name
Gas aggregation nanocluster source ? Reactive sputter deposition of copper and titanium nanoclusters
Original language description
Copper and titanium nanoclusters in Ar and in Ar+O2 gas mixtures were prepared using a magnetron based gas aggregation cluster source designed for Ultra High Vacuum operation. A considerable influence of oxygen addition on the formation of clusters was observed even at oxygen-to-argon admixture levels of the order of 1:1000. A quadrupole mass filter determined nanocluster size distribution while the total deposition rate was determined by quartz crystal measurements.
Czech name
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Czech description
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Type
J<sub>x</sub> - Unclassified - Peer-reviewed scientific article (Jimp, Jsc and Jost)
CEP classification
JJ - Other materials
OECD FORD branch
—

Project
<a href="/en/project/KAN101120701" target="_blank" >KAN101120701: Nanocomposite films and nanoparticles prepared in low pressure plasma for surface modifications</a><br>
Continuities
P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)

Publication year
2011
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

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