Numerical study of plasma fluctuations and their influence upon probe characteristics

Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F46747885%3A24210%2F01%3A24210026" target="_blank" >RIV/46747885:24210/01:24210026 - isvavai.cz</a>
Result on the web
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DOI - Digital Object Identifier
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Result language
angličtina
Original language name
Numerical study of plasma fluctuations and their influence upon probe characteristics
Original language description
Rf or pulsed discharges have attracted a growing interest as a tool for plasma etching and deposition processes. Measurement of current-to-voltage characteristic using a small metallic electrode (Langmuire probe) immersed into the low temperature plasmaenables to determine the most important parameters of the plasma like plasma potential, density and temperature of electrons or electron energy distribution function. Fluctuations of plasma parameters lead to distortion of plasma characteristic. The question how these fluctuations influence errors of computed plasma parameters as been so far solved for special forms of fluctuations, leading to explicit mathematical formulas. To overcome these limitations we developed a code, written in Matlab, treating the problem on purely numerical basis. In contrast to previously published papers numeric access enables to investigate the influence of fluctuations of arbitrary shapes, amplitudes and correlations.
Czech name
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Czech description
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Publication year
2001
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

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