A surfatron plasma source for material processing and biomedical application.

Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F46747885%3A24210%2F03%3A24210108" target="_blank" >RIV/46747885:24210/03:24210108 - isvavai.cz</a>
Result on the web
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DOI - Digital Object Identifier
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Result language
angličtina
Original language name
A surfatron plasma source for material processing and biomedical application.
Original language description
The article present surfatron-based plasma source and preliminary results of probe diagnostic of generated plasma. Plasma is formed from the argon gas flowing through a quartz tube, which is placed in the surfatron cavity. The plasma inside the quartz tue is then sustained further downstream by a surface wave, which propagates along the plasma column. This arrangement enables to create comparatively energetic plasma at the (relatively) remote exit of the quartz tube. We made single and double probe measrements in the plasma exiting from the nozzle at argon pressure several kPa and microwave power around 20W. These measurements yielded the electron temperature around 1 eV and the electron density around 3.1015 m-3.
Czech name
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Czech description
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Publication year
2003
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Article name in the collection
APP Spring Meeting, Bad Honnef, Germany, February 23-26, 2003
ISBN
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ISSN
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e-ISSN
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Number of pages
4
Pages from-to
129-132
Publisher name
Arbeitsgemeinschaft Plasma Physik (APP)
Place of publication
Bad Honnef, Německo
Event location
Bad Honnef, Německo
Event date
Jan 1, 2003
Type of event by nationality
EUR - Evropská akce
UT code for WoS article
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