The Effect of Deposition of Metal Charge Compensation Coating on Surface Morfology of Samples for SEM

Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F46747885%3A24210%2F18%3A00005873" target="_blank" >RIV/46747885:24210/18:00005873 - isvavai.cz</a>
Alternative codes found
RIV/46747885:24620/18:00005873
Result on the web
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DOI - Digital Object Identifier
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Result language
angličtina
Original language name
The Effect of Deposition of Metal Charge Compensation Coating on Surface Morfology of Samples for SEM
Original language description
The paper deals with the study of layers applied by magnetic sputtering on samples for electron microscopy to obtain electric conductive surface. It describes the effect of different deposition parameters on the change of the surface morphology of the samples. The reference substrate is pure Si wafer; as the coating material was selected the most commonly used gold and platinum. Scanning Electron Microscopy and Atomic Force Microscopy were used for qualitative and quantitative evaluation of the structural changes.
Czech name
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Czech description
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Project
Result was created during the realization of more than one project. More information in the Projects tab.
Continuities
P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)

Publication year
2018
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Article name in the collection
(2018) NANOCON 2017 - Conference Proceedings, 9th International Conference on Nanomaterials - Research and Application
ISBN
978-80-87294-81-9
ISSN
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e-ISSN
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Number of pages
6
Pages from-to
848-853
Publisher name
TANGER Ltd
Place of publication
Ostrava
Event location
Brno
Event date
Jan 1, 2017
Type of event by nationality
EUR - Evropská akce
UT code for WoS article
000452823300141

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