Control of structure in magnetron sputtered thin film

Result code in IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F49777513%3A23520%2F01%3A00064893" target="_blank" >RIV/49777513:23520/01:00064893 - isvavai.cz</a>

Result on the web

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DOI - Digital Object Identifier

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Result language

angličtina

Original language name

Control of structure in magnetron sputtered thin film

Original language description

The paper describes two methods which can be used to control the film structure: (1) the energy delivered to the growing film, i.e. (i) substrate heating and (ii) ion bombardment; and (2) the interlayer inserted between the substrate and the film. Thesemethods were tested on Cu and Zr-Y-N films and Cu and Cr-Ni-N films used as interlayers. It was found that both methods can improve the crystallinity of sputter deposited films. Dependences of the film structure on substrate temperature, negative substrate bias and substrate ion current density are given. The effect of the interlayer on the structure of the deposited film is also clearly demonstrated.

Czech name

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Czech description

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Type

J_x - Unclassified - Peer-reviewed scientific article (Jimp, Jsc and Jost)

CEP classification

BL - Plasma physics and discharge through gases

OECD FORD branch

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Project

Result was created during the realization of more than one project. More information in the Projects tab.

Continuities

P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)<br>Z - Vyzkumny zamer (s odkazem do CEZ)

Publication year

2001

Confidentiality

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Name of the periodical

Surface and Coatings Technology

ISSN

02578972

e-ISSN

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Volume of the periodical

Vol. 142

Issue of the periodical within the volume

leden

Country of publishing house

US - UNITED STATES

Number of pages

5

Pages from-to

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UT code for WoS article

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EID of the result in the Scopus database

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