Properties of nanocrystalline Al-Cu-O films reactively sputtered by DC pulse dual magnetron
The result's identifiers
Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F49777513%3A23520%2F11%3A43898490" target="_blank" >RIV/49777513:23520/11:43898490 - isvavai.cz</a>
Result on the web
<a href="http://dx.doi.org/10.1016/j.apsusc.2011.10.039" target="_blank" >http://dx.doi.org/10.1016/j.apsusc.2011.10.039</a>
DOI - Digital Object Identifier
<a href="http://dx.doi.org/10.1016/j.apsusc.2011.10.039" target="_blank" >10.1016/j.apsusc.2011.10.039</a>
Alternative languages
Result language
angličtina
Original language name
Properties of nanocrystalline Al-Cu-O films reactively sputtered by DC pulse dual magnetron
Original language description
The article reports on the effect of the addition of Cu in the Al2O3 film on its mechanical and optical properties. The Al-Cu-O films were reactively co-sputtered using DC pulse dual magnetron in a mixture of argon and oxygen. The amount of Al and Cu inthe Al-Cu-O film was controlled by the length of pulse at the Al/Cu target. It is shown that the structure of Al-Cu-O film gradually varies with increasing Cu content from Al2O3 through Al-Cu-O nanocrystalline solid solution to CuAl2O4 spinel structure.The Al-Cu-O films exhibit (i) relatively high hardness (ii) enhanced elastic recovery (iii) low values of Young's modulus and (iv) enhanced resistance to cracking during indentation under high load.
Czech name
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Czech description
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Classification
Type
J<sub>x</sub> - Unclassified - Peer-reviewed scientific article (Jimp, Jsc and Jost)
CEP classification
BL - Plasma physics and discharge through gases
OECD FORD branch
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Result continuities
Project
<a href="/en/project/OC10045" target="_blank" >OC10045: Novel plasma sources for film deposition and surface modification</a><br>
Continuities
P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)<br>Z - Vyzkumny zamer (s odkazem do CEZ)
Others
Publication year
2011
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů
Data specific for result type
Name of the periodical
APPLIED SURFACE SCIENCE
ISSN
0169-4332
e-ISSN
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Volume of the periodical
2011
Issue of the periodical within the volume
258
Country of publishing house
NL - THE KINGDOM OF THE NETHERLANDS
Number of pages
6
Pages from-to
1762-1767
UT code for WoS article
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EID of the result in the Scopus database
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