Mechanical characterization of a-C:H:SiOx coatings synthesized using radio-frequency plasma-assisted chemical vapor deposition method

Result code in IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F49777513%3A23520%2F15%3A43925957" target="_blank" >RIV/49777513:23520/15:43925957 - isvavai.cz</a>

Alternative codes found

RIV/46747885:24620/15:00002099

Result on the web

<a href="http://dx.doi.org/10.1016/j.tsf.2015.08.017" target="_blank" >http://dx.doi.org/10.1016/j.tsf.2015.08.017</a>

DOI - Digital Object Identifier

<a href="http://dx.doi.org/10.1016/j.tsf.2015.08.017" target="_blank" >10.1016/j.tsf.2015.08.017</a>

Result language

angličtina

Original language name

Mechanical characterization of a-C:H:SiOx coatings synthesized using radio-frequency plasma-assisted chemical vapor deposition method

Original language description

A series of silicone-oxide containing hydrogenated amorphous carbon (a-C:H:SiOx) was deposited on polished silicon substrates by radio-frequency plasma assisted chemical vapour deposition method using methane and hexamethyldisiloxane. Three methane/hexamathyldisiloxane flow ratios and four self-bias voltages were applied for the synthesis of different a-C:H:SiOx coatings having different properties and silicon/oxygen concentrations. The chemical structure of the deposited films was determined by Fourier transform infrared spectroscopy. Detailed characterisation of the mechanical properties of SiOx incorporated carbon coatings was made using the nanoindentation (hardness and modulus) and profillometry (residual stress) methods. Hardness and elastic modulus were used for evaluation of the endurance capability and resistance to plastic deformation. The elastic recovery was calculated based on loading and unloading curves. The residual stress of diamond-like carbon coatings can be effectively reduced by the incorporation of SiOx. The mechanism of reducing the residual stress depending on the applied self-bias voltage is proposed. In the case of all of the examined coatings the addition of SiOx reduces the hardness, while for high self-bias voltages and increase of endurance capability and resistance to plastic deformation is observed.

Czech name

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Czech description

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Type

J_x - Unclassified - Peer-reviewed scientific article (Jimp, Jsc and Jost)

CEP classification

JJ - Other materials

OECD FORD branch

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Project

Result was created during the realization of more than one project. More information in the Projects tab.

Continuities

I - Institucionalni podpora na dlouhodoby koncepcni rozvoj vyzkumne organizace

Publication year

2015

Confidentiality

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Name of the periodical

Thin Solid Films

ISSN

0040-6090

e-ISSN

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Volume of the periodical

590

Issue of the periodical within the volume

SEP 1

Country of publishing house

CH - SWITZERLAND

Number of pages

7

Pages from-to

299-305

UT code for WoS article

000361057100045

EID of the result in the Scopus database

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