Study of the high-temperature oxidation resistance mechanism of magnetron sputtered Hf7B23Si17C4N45 film

Result code in IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F49777513%3A23520%2F18%3A43949540" target="_blank" >RIV/49777513:23520/18:43949540 - isvavai.cz</a>

Result on the web

<a href="https://doi.org/10.1116/1.5004145" target="_blank" >https://doi.org/10.1116/1.5004145</a>

DOI - Digital Object Identifier

<a href="http://dx.doi.org/10.1116/1.5004145" target="_blank" >10.1116/1.5004145</a>

Result language

angličtina

Original language name

Study of the high-temperature oxidation resistance mechanism of magnetron sputtered Hf7B23Si17C4N45 film

Original language description

The microstructure evolution and high temperature oxidation mechanism of a hard, amorphous, and optically transparent Hf7B23Si17C4N45 film was studied by x-ray diffraction and transmission electron microscopy. The Hf7B23Si17C4N45 films were deposited by reactive pulse dc magnetron sputtering and annealed in air at temperatures from 1100 to 1500 °C. All annealed films were found to have a two-layered structure composed of the original amorphous and homogeneous layer followed by a nanocomposite oxidized surface layer. The top nanocomposite layer consists of an amorphous SiOx-based matrix and a population of HfO2 nanoparticles with two distinct sublayers. The first sublayer is next to the original amorphous layer and has a dense population of small HfO2 nanoparticles (up to several nanometers) followed by a surface sublayer with coarsened and dispersed HfO2 nanoparticles (up to several tens nm). The HfO2 nanoparticles in the bottom sublayer form by a nucleation and growth process whereas the ones in the surface sublayer coarsen via Ostwald ripening. An estimate of the activation energy for oxygen diffusion through the oxidized layer produced a value around 3.43 eV attesting to the high oxidation resistance of the film. The oxidation resistance mechanism is attributed to the precipitation of HfO2 nanoparticles within a dense SiOx-based matrix and quartz SiO2 in front of the base layer interface that can act as a barrier to heat transfer and O diffusion.

Czech name

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Czech description

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Type

J_imp - Article in a specialist periodical, which is included in the Web of Science database

CEP classification

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OECD FORD branch

20506 - Coating and films

Project

<a href="/en/project/GA17-08944S" target="_blank" >GA17-08944S: Nanostructured coatings synthesized using highly reactive pulsed plasmas</a><br>

Continuities

P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)

Publication year

2018

Confidentiality

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Name of the periodical

Journal of Vacuum Science and Technology A

ISSN

0734-2101

e-ISSN

—

Volume of the periodical

36

Issue of the periodical within the volume

2

Country of publishing house

US - UNITED STATES

Number of pages

13

Pages from-to

"021505-1"-"021505-13"

UT code for WoS article

000426978500030

EID of the result in the Scopus database

2-s2.0-85037718796