Study of the high-temperature oxidation resistance mechanism of magnetron sputtered Hf7B23Si17C4N45 film
Result description
The microstructure evolution and high temperature oxidation mechanism of a hard, amorphous, and optically transparent Hf7B23Si17C4N45 film was studied by x-ray diffraction and transmission electron microscopy. The Hf7B23Si17C4N45 films were deposited by reactive pulse dc magnetron sputtering and annealed in air at temperatures from 1100 to 1500 °C. All annealed films were found to have a two-layered structure composed of the original amorphous and homogeneous layer followed by a nanocomposite oxidized surface layer. The top nanocomposite layer consists of an amorphous SiOx-based matrix and a population of HfO2 nanoparticles with two distinct sublayers. The first sublayer is next to the original amorphous layer and has a dense population of small HfO2 nanoparticles (up to several nanometers) followed by a surface sublayer with coarsened and dispersed HfO2 nanoparticles (up to several tens nm). The HfO2 nanoparticles in the bottom sublayer form by a nucleation and growth process whereas the ones in the surface sublayer coarsen via Ostwald ripening. An estimate of the activation energy for oxygen diffusion through the oxidized layer produced a value around 3.43 eV attesting to the high oxidation resistance of the film. The oxidation resistance mechanism is attributed to the precipitation of HfO2 nanoparticles within a dense SiOx-based matrix and quartz SiO2 in front of the base layer interface that can act as a barrier to heat transfer and O diffusion.
Keywords
thermodynamic processesX-ray diffractionactivation energiesCorrosion
The result's identifiers
Result code in IS VaVaI
Result on the web
DOI - Digital Object Identifier
Alternative languages
Result language
angličtina
Original language name
Study of the high-temperature oxidation resistance mechanism of magnetron sputtered Hf7B23Si17C4N45 film
Original language description
The microstructure evolution and high temperature oxidation mechanism of a hard, amorphous, and optically transparent Hf7B23Si17C4N45 film was studied by x-ray diffraction and transmission electron microscopy. The Hf7B23Si17C4N45 films were deposited by reactive pulse dc magnetron sputtering and annealed in air at temperatures from 1100 to 1500 °C. All annealed films were found to have a two-layered structure composed of the original amorphous and homogeneous layer followed by a nanocomposite oxidized surface layer. The top nanocomposite layer consists of an amorphous SiOx-based matrix and a population of HfO2 nanoparticles with two distinct sublayers. The first sublayer is next to the original amorphous layer and has a dense population of small HfO2 nanoparticles (up to several nanometers) followed by a surface sublayer with coarsened and dispersed HfO2 nanoparticles (up to several tens nm). The HfO2 nanoparticles in the bottom sublayer form by a nucleation and growth process whereas the ones in the surface sublayer coarsen via Ostwald ripening. An estimate of the activation energy for oxygen diffusion through the oxidized layer produced a value around 3.43 eV attesting to the high oxidation resistance of the film. The oxidation resistance mechanism is attributed to the precipitation of HfO2 nanoparticles within a dense SiOx-based matrix and quartz SiO2 in front of the base layer interface that can act as a barrier to heat transfer and O diffusion.
Czech name
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Czech description
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Classification
Type
Jimp - Article in a specialist periodical, which is included in the Web of Science database
CEP classification
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OECD FORD branch
20506 - Coating and films
Result continuities
Project
GA17-08944S: Nanostructured coatings synthesized using highly reactive pulsed plasmas
Continuities
P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)
Others
Publication year
2018
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů
Data specific for result type
Name of the periodical
Journal of Vacuum Science and Technology A
ISSN
0734-2101
e-ISSN
—
Volume of the periodical
36
Issue of the periodical within the volume
2
Country of publishing house
US - UNITED STATES
Number of pages
13
Pages from-to
"021505-1"-"021505-13"
UT code for WoS article
000426978500030
EID of the result in the Scopus database
2-s2.0-85037718796
Basic information
Result type
Jimp - Article in a specialist periodical, which is included in the Web of Science database
OECD FORD
Coating and films
Year of implementation
2018